粒子測定は、サンプル中の粒子をカウントおよびサイジングするプロセスであり、大気または液体のいずれかで実行されます。 この技術は、高い流体純度が必要であり、粒子状汚染物質の存在が製品の廃棄物やシステムの損傷につながる可能性がある半導体ウェーハ製造などの工業プロセスで顕著に見られます。
課題
In a semiconductor wafer fabrication process, particle measurement is in use to ensure that chemical, cooling and cleaning fluids are free from such contaminants. Industries such as these begin to leverage the power of particle measuring against contamination. This results in size and space of the equipment required to perform this analysis starting to become an issue. OEMs and system integrators need ease of integration without incurring costly platform redesigns. Liquid particle measuring is performed by specialist instrumentation that can be integrated into the production line. High power lasers equips such instruments. These lasers deliver a balance of high power and low noise in a compact, high reliability platform.
粒子測定はどのように機能しますか？
Particulates can be present in a range of sizes and materials. Determining the properties of the contaminant is therefore critical in understanding its presence and possible source of contamination. In order to accurately determine contaminant properties, air-cooled laser solutions are employed. The laser, and either an array detector or CCD camera analyses the diffracted light which then determines the properties of the particles passing between them. Depending on the power necessary, a 532 nm gem or opus laser from Laser Quantum perfectly matches to this application. The laser beam directs through a flow cell at an angle perpendicular to the liquid flow. The beam precisely directs through the liquid to a pin hole aperture with beam dump. Any particles that strike the laser beam cause the light to diffract away from this beam dump.
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