New GEMultra overcomes specification breakdown and sub-par performance
Novanta continues to drive innovations that deliver real value to our customers. Life Science, Semiconductor, and Industrial Scientific sectors using 532 nm lasers will see accurate, consistent results without taking extreme integration and operating steps to maintain narrow operating temperature specifications.
GEMultra delivers consistent output power regardless of variable operating temperatures while maintaining constant performance specifications. New ULTRALOQ™ technology is a cutting-edge material system designed to maximize stability and robustness while supporting new automated build processes. An onboard variable optical attenuator (VOA) ensures stability and adherence to performance specifications – even during power changes, significantly enhancing operational flexibility while reducing integration complexity and cost.
Rapidly changing ambient temperatures can stress laser cavities, causing unstable laser output, resulting in false positives, unplanned downtime and reduced lifespan. Novanta’s ULTRALOQ™ technology features a precision engineered material system designed specifically to endure extreme temperatures and rapidly changing environments while supporting fully automated manufacturing processes.
GEMultra delivers nominal output power of 2 Watts while maintaining a consistent beam diameter of 0.9 ± 0.1 mm with peak-to-peak power stability of < 1%. Beam size and peak-to-peak power stability remains constant at different power levels. The consistent power specifications ensure accurate results and decrease false positives and unplanned downtimes associated with sub-par performance.
Meeting high performance specifications across a wide range of power levels is challenging, and often requires separate attenuators, leading to added cost and integration challenges for OEMs. GEMultra incorporates an onboard VOA, achieving a maximum attenuation of OD2. This ensures stability and adherence to performance specifications, even during power changes, enhancing operational flexibility while reducing integration complexity and cost.
A versatile 532 nm laser, GEMultra incorporates several features to broaden application usage, enhance usability, including: